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Shaanxi KeGu New Material Technology Co., Ltd

Shaanxi KeGu New Material Technology Co., Ltd

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Home / Products / Silicon Carbide Ceramic / Silicon Carbide Tray & SiC Wafer Holder with 1650°C Max Service Temp, High Thermal Conductivity, and Plasma & Corrosion Resistance for ICP Etching /

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Silicon Carbide Ceramic

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Reaction Bonded Silicon Carbide

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Heating Elements

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Silicon Nitride Ceramic

 [12]

Aluminum Oxide Ceramic

 [35]

Zirconia Oxide Ceramic

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Boron Nitride Ceramic

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Ceramic Powder

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Shaanxi KeGu New Material Technology Co., Ltd
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City:chaoyang
Province/State:Shaanxi
Country/Region:china
Contact Person:MsYuki
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Silicon Carbide Tray & SiC Wafer Holder with 1650°C Max Service Temp, High Thermal Conductivity, and Plasma & Corrosion Resistance for ICP Etching
Silicon Carbide Tray & SiC Wafer Holder with 1650°C Max Service Temp, High Thermal Conductivity, and Plasma & Corrosion Resistance for ICP Etching
  • Silicon Carbide Tray & SiC Wafer Holder with 1650°C Max Service Temp, High Thermal Conductivity, and Plasma & Corrosion Resistance for ICP Etching
  • Silicon Carbide Tray & SiC Wafer Holder with 1650°C Max Service Temp, High Thermal Conductivity, and Plasma & Corrosion Resistance for ICP Etching
  • Silicon Carbide Tray & SiC Wafer Holder with 1650°C Max Service Temp, High Thermal Conductivity, and Plasma & Corrosion Resistance for ICP Etching
Products Detailed
Overview: Silicon Carbide (SiC) trays and plates are precision-engineered wafer carriers designed specifically for Inductively Coupled Plasma (ICP) ...
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